The laser image generator – new opportunities of the institute

The laser image generator – new opportunities of the institute

The laser multi-channel image generator ЭМ – 5189-02 was set in operation at OJSC “MRIOR” in February 2014.

The device is intended for the formation of topological structures directly on semiconductor wafers and exposure masks’ blanks. It relates to devices of the 5th generation technology of 350 nm level.

The generator provides the manufacturing of products under the photolithography technology using photoresists, which maximum sensitivity area is near the field of UV radiation. The figure is formed by focused laser emission with a wavelength of 355 nm.

Using the generator to produce exposure masks allows to reduce the production string twice. It provides significant savings in expensive exposure masks’ blanks (acquired in other companies), and various chemical reagents. Thus, the average cost of manufacturing exposure masks decreased several times.

Manufacturing of exposure masks gets a higher level of quality. This equipment allows to produce guaranteed high-quality exposure masks with a minimum element size of 0.6 micron used for further manufacture of various microwave devices.

Thereby, there is the possibility of manufacturing microwave devices in the scientific research and experimental design works, as well as in small batches, bypassing the stage of manufacturing of exposure masks, which significantly (at least 2 times) reduces the manufacturing time and saves materials.

The value of these services is higher, because they can be integrated with other complementary procedures, in particular, the problems solved with the help of laser cutting facility of ceramic materials.