News

6 november 2018

The deposition of metallic films is carried out by electron‑beam evaporation and magnetron sputtering, which is one of the operations performed in the Department of Vacuum and Plasma‑Chemical Processes of JSC «Minsk Research Institute of Radio Materials».

Deposition of molybdenum, tungsten, chromium films, aluminum films, gold films, and other refractory, resistive, and precious metals is carried out.

The available equipment and the experience of specialists make it possible to ensure high reproducibility of the electrophysical parameters of the obtained films during the deposition process.

Deposition is performed on substrates (ceramics, sitall, polycor, gallium arsenide, silicon, glass) with a diameter up to 100 mm and/or dimensions of 48×60 mm.

Organizations and enterprises of the Republic of Belarus as well as enterprises of the Russian Federation use MNIRRM’s services in the field of metallic film deposition.

For questions related to metallic film deposition and board manufacturing, please contact by phone +(375 17) 398‑30‑13, MTS: +(375 33) 333‑95‑22 or by e‑mail marketing@mniirm.by.