News

29 august 2018

Deposition of metallization and resistive layers by magnetron sputtering

JSC «Minsk Research Institute of Radio Materials» provides services for depositing metallic films of refractory and resistive metals (RS-3710, RS-5406, Mo, V, Cr, Ni, Cu, NiCr/V/Ni, Ni-Au) using magnetron sputtering methods.

The available equipment and the expertise of our specialists ensure high reproducibility of the electrophysical parameters of the resulting resistive films during the deposition process.

Deposition is performed on sitall and polycor substrates sized 48×60 mm, as well as on gallium arsenide and silicon substrates with diameters up to 100 mm.

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For this operation, the VSE-PVD-DESK-PRO system is used.

Advantages of using this system:

- The diameter of the non-sputtered central part of the magnetron is minimized;

- Ease of use is combined with high quality of the resulting coatings;

- High repeatability of results allows producing series of samples with specified properties.


Organizations and enterprises in the Republic of Belarus, including JSC «Minsk Scientific Research Instrument-Making Institute» (MNIPI), JSC «Design Bureau “Display”», and the Educational Institution «Belarusian State University of Informatics and Radioelectronics», as well as a number of enterprises of the Russian Federation, use MNIRRM’s magnetron deposition services for metallic films.

The advantages of cooperation with MNIRRM for the deposition of refractory and resistive metal films include:

- Mobility;

- Prompt order fulfillment;

- High quality;

- Provision of services for the manufacture of hybrid boards.

 

For all inquiries related to metallic film deposition and board manufacturing, please contact by phone +(375 17) 398-30-13, MTS: +(375 33) 333-95-22 or by e-mail marketing@mniirm.by.

MNIRRM is ready to consider all possible options for mutually beneficial cooperation.