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GaAs wafers recycling
GaAs wafers recycling

There is a great variety of refused materials, which can be on different stages of semiconductor devices manufacturing.

Production of exposure masks
Production of exposure masks

Laser multi-channel ЭМ-5189-02 image generator (IG) is used to form a topological structure on semiconductor wafers and exposure mask’s blanks. The device refers to the 5-th technology generation – technological level of 350 nm.


1. Research, constructions and technologies design, manufacturing of:

· microwave monolithic integrated circuits, transistors, diodes, etc. with

0.18-micron design rules on the basis of A3B5 (frequency range up to 18 GHz);

· optoelectronic semiconductor elements of infra-red and visible wavelength range based A3B5 materials;

· optoelectronic, including transmitting and receiving modules

for fiber-optic;

· sensors of physical and chemical variables on the basis

of MEMS sensors;

· MEMS sensors based on silicon;

· gallium arsenide substrates standard «epi-ready»;

· medical gas mixtures;

· galvanization (Sn, Bi, Cu, Ni).

2. Service of the medical equipment.

3. Milling and turning works on NC machine tools.

4. Consultations on using sensors "Glucometer" and “Glucosen” for diabetics.


86-2, Lietenanta Kizhevatova st. 
Minsk 220024
Republic of Belarus
Phone: 8 (10-375-17) 270 96 06   
Fax: 8 (10-375-17) 270 96 11
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